Invention Grant
US08623582B2 Treatment for enhancing crack resistance of organic photoconductors
有权
用于提高有机感光体的抗裂性的处理
- Patent Title: Treatment for enhancing crack resistance of organic photoconductors
- Patent Title (中): 用于提高有机感光体的抗裂性的处理
-
Application No.: US11830430Application Date: 2007-07-30
-
Publication No.: US08623582B2Publication Date: 2014-01-07
- Inventor: Eran Gonen , Yossi Rosen , Mark Sandler
- Applicant: Eran Gonen , Yossi Rosen , Mark Sandler
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Main IPC: G03G5/04
- IPC: G03G5/04

Abstract:
A method of treating a photoconductor for enhancing crack resistance when it comes into contact with a liquid toner comprises bending a photoconductor sheet having a length and a width to a tube having an outer diameter and a length corresponding to the width of the photoconductor sheet with the photoconductive layer facing outward. The tube of the photoconductor sheet is then inserted into a cylinder having an inner diameter greater than the outer diameter of the tube and a length of at least the length of the tube of the photoconductor sheet. The treatment of the tube of the photoconductor sheet in the cylinder takes place by maintaining it in the cylinder at a temperature of from about room temperature to an elevated temperature. The tube of the photoconductor sheet is removed from the cylinder while it is at about room temperature.
Public/Granted literature
- US20090035689A1 Treatment For Enhancing Crack Resistance Of Organic Photoconductors Public/Granted day:2009-02-05
Information query