Invention Grant
- Patent Title: Method of manufacturing liquid ejection head substrate
- Patent Title (中): 液体喷射头基板的制造方法
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Application No.: US13547847Application Date: 2012-07-12
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Publication No.: US08623674B2Publication Date: 2014-01-07
- Inventor: Masaya Uyama
- Applicant: Masaya Uyama
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2011-166614 20110729
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A liquid ejection head substrate including a silicon substrate having a liquid supply port as hollow and slots as through holes connecting the hollow and a liquid channel arranged opposite sides of the substrate. The method includes etching the substrate to form the hollow; forming a first resist on the hollow; etching the first resist on the bottom of the hollow under conditions of securing an equal etching rate to both the silicon substrate and the first resist; forming a second resist on the hollow; patterning the second resist into an etching mask; and etching the substrate using the etching mask to form the through holes.
Public/Granted literature
- US20130029437A1 METHOD OF MANUFACTURING LIQUID EJECTION HEAD SUBSTRATE Public/Granted day:2013-01-31
Information query
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