Invention Grant
US08623675B2 Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device 有权
光束均化器,激光照射装置以及半导体装置的制造方法

Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device
Abstract:
The energy distribution of the beam spot on the irradiated surface changes due to the change in the oscillation condition of the laser or before and after the maintenance. The present invention provides an optical system for forming a rectangular beam spot on an irradiated surface including a beam homogenizer for homogenizing the energy distribution of the rectangular beam spot on the irradiated surface in a direction of its long or short side. The beam homogenizer includes an optical element having a pair of reflection planes provided oppositely for reflecting the laser beam in the direction where the energy distribution is homogenized and having a curved shape in its entrance surface. The entrance surface of the optical element means a surface of the optical element where the laser beam is incident first.
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