Invention Grant
- Patent Title: Methods of forming electrostatic discharge devices
- Patent Title (中): 形成静电放电装置的方法
-
Application No.: US13732196Application Date: 2012-12-31
-
Publication No.: US08623731B2Publication Date: 2014-01-07
- Inventor: Kai Esmark
- Applicant: Kai Esmark
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L21/331
- IPC: H01L21/331

Abstract:
Electrostatic discharge devices and methods of forming thereof are disclosed. In one embodiment, a semiconductor device includes an electrostatic discharge (ESD) device region disposed within a semiconductor body. A first ESD device is disposed in a first region of the ESD device region, and a second ESD device disposed in a second region of the ESD device region. The second region is separated from the first region by a first trench.
Public/Granted literature
- US20130122677A1 Methods of Forming Electrostatic Discharge Devices Public/Granted day:2013-05-16
Information query
IPC分类: