Invention Grant
- Patent Title: Pattern modification schemes for improved FIB patterning
- Patent Title (中): 用于改进FIB图案化的图案修改方案
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Application No.: US13655129Application Date: 2012-10-18
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Publication No.: US08624206B2Publication Date: 2014-01-07
- Inventor: Tom Miller , Gene Mirro , Cornelis Sander Kooijman , Hendrik Jan de Vos
- Applicant: FEI Company
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Associates, PC
- Agent Michael O. Scheinberg
- Main IPC: H01J3/26
- IPC: H01J3/26

Abstract:
An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the invention, a digital filter is applied to the scan pattern prior to digital-to-analog (D/A) conversion in order to reduce or eliminate over-shoot effects that can result from TOF errors. In other embodiments, analog filters or the use of signal amplifiers with a lower bandwidth can also be used to compensate for TOF errors. By altering the scan pattern, over-shoot effects can be significantly reduced or eliminated.
Public/Granted literature
- US20130092826A1 Pattern Modification Schemes for Improved FIB Patterning Public/Granted day:2013-04-18
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