Invention Grant
- Patent Title: Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and el television
- Patent Title (中): 具有膜图案的基板及其制造方法,半导体装置,液晶电视和电视机的制造方法
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Application No.: US13612146Application Date: 2012-09-12
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Publication No.: US08624252B2Publication Date: 2014-01-07
- Inventor: Shinji Maekawa , Gen Fujii , Hiroko Shiroguchi , Masafumi Morisue
- Applicant: Shinji Maekawa , Gen Fujii , Hiroko Shiroguchi , Masafumi Morisue
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Nixon Peabody LLP
- Agent Jeffrey L. Costellia
- Priority: JP2004-009232 20040116; JP2004-134898 20040428
- Main IPC: H01L29/04
- IPC: H01L29/04 ; H01L29/10 ; H01L31/00 ; H01L27/14 ; H01L29/15 ; H01L31/036 ; H01L27/12

Abstract:
The invention provides a manufacturing method of a substrate having a film pattern including an insulating film, a semiconductor film, a conductive film and the like by simple steps, and also a manufacturing method of a semiconductor device which is low in cost with high throughput and yield. According to the invention, after forming a first protective film which has low wettability on a substrate, a material which has high wettability is applied or discharged on an outer edge of a first mask pattern, thereby a film pattern and a substrate having the film pattern are formed.
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