Invention Grant
- Patent Title: RF non-contact thin film measurement using two port waveguide
- Patent Title (中): RF非接触式薄膜测量采用两端口波导
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Application No.: US12816184Application Date: 2010-06-15
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Publication No.: US08624612B2Publication Date: 2014-01-07
- Inventor: Mun Choi
- Applicant: Mun Choi
- Assignee: Electronic Testing Services, LLC
- Current Assignee: Electronic Testing Services, LLC
- Agency: Stetina Brunda Garred & Brucker
- Main IPC: G01R27/08
- IPC: G01R27/08

Abstract:
The system disclosed herein for non-destructively testing a resistive film includes first and second waveguides that are gapped apart from each other. The resistive film is disposed between the first and second waveguides and tested. The film is then advanced and re-tested by the first and second waveguides. The waveguides do not contact the film during testing or while the film is being advanced to its next position. Accordingly, the system provides a non-destructive method of testing the sheet resistance of a film in an accurate manner.
Public/Granted literature
- US20110304347A1 RF Non-Contact Thin Film Measurement Using Two Port Waveguide Public/Granted day:2011-12-15
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