Invention Grant
US08624950B2 Surface-emitting laser comprising emission region having peripheral portion with anisotropy in two perpendicular directions, and surface-emitting laser array, optical scanning apparatus and image forming apparatus including the same
有权
表面发射激光器包括具有在两个垂直方向上具有各向异性的周边部分的发射区域和表面发射激光器阵列,光学扫描装置和包括该发射区域的图像形成装置
- Patent Title: Surface-emitting laser comprising emission region having peripheral portion with anisotropy in two perpendicular directions, and surface-emitting laser array, optical scanning apparatus and image forming apparatus including the same
- Patent Title (中): 表面发射激光器包括具有在两个垂直方向上具有各向异性的周边部分的发射区域和表面发射激光器阵列,光学扫描装置和包括该发射区域的图像形成装置
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Application No.: US13386725Application Date: 2010-09-14
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Publication No.: US08624950B2Publication Date: 2014-01-07
- Inventor: Naoto Jikutani , Kazuhiro Harasaka , Satoru Sugawara , Shunichi Sato
- Applicant: Naoto Jikutani , Kazuhiro Harasaka , Satoru Sugawara , Shunichi Sato
- Applicant Address: JP Tokyo
- Assignee: Ricoh Company, Ltd.
- Current Assignee: Ricoh Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Cooper & Dunham LLP
- Priority: JP2009-217917 20090918; JP2010-152678 20100705
- International Application: PCT/JP2010/066270 WO 20100914
- International Announcement: WO2011/034194 WO 20110324
- Main IPC: B41J2/45
- IPC: B41J2/45 ; H01S5/00

Abstract:
A surface-emitting laser includes a substrate; a lower semiconductor multilayer film reflector disposed on the substrate; a resonator structure including an active layer and disposed on the lower semiconductor multilayer film reflector; and an upper semiconductor multilayer film reflector disposed on the resonator structure. The second semiconductor multilayer film reflector includes a confinement structure in which a current passage region is surrounded by an oxidized portion of a selectively oxidized layer containing aluminum. An emission region includes a central portion and a peripheral portion, the peripheral portion being covered with a transparent dielectric film whose reflectivity is lower than a reflectivity of the central portion. The selectively oxidized layer has a thickness in a range from 30 nm to 40 nm. The temperature at which an oscillation threshold current is minimized is 60° C. or lower.
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