Invention Grant
- Patent Title: Lithographic apparatus, projection system and damper for use in a lithographic apparatus and device manufacturing method
- Patent Title (中): 用于光刻设备的光刻设备，投影系统和阻尼器以及器件制造方法
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Application No.: US12258689Application Date: 2008-10-27
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Publication No.: US08625070B2Publication Date: 2014-01-07
- Inventor: Windy Lynn Farnsworth , Santiago E. Del Puerto , Samir A. Nayfeh
- Applicant: Windy Lynn Farnsworth , Santiago E. Del Puerto , Samir A. Nayfeh
- Applicant Address: NL Veldhoven
- Assignee: ASML Holding N.V.
- Current Assignee: ASML Holding N.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/54
Abstract:
In a lithographic apparatus, dampers are provided that may be used within mounts for optical elements in order to damp the motion of the optical element relative to the component to which it is mounted.
Public/Granted literature
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