Invention Grant
US08625072B2 Exposure apparatus, exposure method, and method of manufacturing device
有权
曝光装置,曝光方法和制造装置的方法
- Patent Title: Exposure apparatus, exposure method, and method of manufacturing device
- Patent Title (中): 曝光装置,曝光方法和制造装置的方法
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Application No.: US13099686Application Date: 2011-05-03
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Publication No.: US08625072B2Publication Date: 2014-01-07
- Inventor: Takanori Sato
- Applicant: Takanori Sato
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2010-107716 20100507
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52

Abstract:
A scanning exposure apparatus measures levels of a substrate at a predetermined position on the substrate at a first measurement point during the acceleration period and a second measurement point during the constant velocity period, obtains a correction value for a measurement error due to factors associated with acceleration based on the measurement results, corrects the measured level using the obtained correction value and exposes the substrate so that the level at a given position on the substrate becomes equal to the corrected level, when the substrate is exposed at the given position after the level is measured while the stage accelerates, and exposes the substrate so that the level at a given position on the substrate becomes equal to the measured level measured, when the substrate is exposed after the level of the substrate at the given position is measured while the stage moves at a constant velocity.
Public/Granted literature
- US20110273686A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DEVICE Public/Granted day:2011-11-10
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