Invention Grant
- Patent Title: Aberration measurement method and system including interferometer and signal processing unit
- Patent Title (中): 检测方法和系统包括干涉仪和信号处理单元
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Application No.: US12961664Application Date: 2010-12-07
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Publication No.: US08625102B2Publication Date: 2014-01-07
- Inventor: Yasuhiro Sawada , Satoru Komatsu
- Applicant: Yasuhiro Sawada , Satoru Komatsu
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2009-277157 20091207
- Main IPC: G01B9/02
- IPC: G01B9/02

Abstract:
An aberration measurement system includes an interferometer that includes a polarization adjuster configured to adjust a polarization plane of coherent light, and a phase shifter configured to shift a phase of reference light. The aberration measurement system further includes a signal processing unit configured to obtain a nonpolarization aberration of the test object, and coefficients a=sin ε cos 2θ, b=sin ε sin 2θ, and c=cos ε for a retardation amount 2ε and a principal axis direction θ of a polarization aberration of the test object, based on data of a plurality of interference pattern images which provide at least three complex visibilities obtained from the interferometer after a polarization adjuster adjusts the polarization plane of the coherent light, and to determine signs of the coefficients a, b, and c based on the nonpolarization aberration.
Public/Granted literature
- US20110135145A1 ABERRATION MEASUREMENT METHOD AND SYSTEM INCLUDING INTERFEROMETER AND SIGNAL PROCESSING UNIT Public/Granted day:2011-06-09
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