Invention Grant
- Patent Title: Graded bevel tapered write pole design for field enhancement
- Patent Title (中): 分级斜面锥形写柱设计用于场增强
-
Application No.: US12150553Application Date: 2008-04-29
-
Publication No.: US08625234B2Publication Date: 2014-01-07
- Inventor: Lijie Guan , Po-Kang Wang , Moris Dovek , Joe Smyth , Kenichi Takano , Yoshitaka Sasaki
- Applicant: Lijie Guan , Po-Kang Wang , Moris Dovek , Joe Smyth , Kenichi Takano , Yoshitaka Sasaki
- Applicant Address: US CA Milpitas
- Assignee: Headway Technologies, Inc.
- Current Assignee: Headway Technologies, Inc.
- Current Assignee Address: US CA Milpitas
- Agency: Saile Ackerman LLC
- Agent Stephen B. Ackerman
- Main IPC: G11B5/31
- IPC: G11B5/31
Abstract:
A structure and a process for a perpendicular write pole that provides increased magnetic flux at the ABS is disclosed. This is accomplished by increasing the amount of write flux that originates above the write gap, without changing the pole taper at the ABS. Three embodiment of the invention are discussed.
Public/Granted literature
- US20090268344A1 Graded bevel tapered write pole design for field enhancement Public/Granted day:2009-10-29
Information query
IPC分类:
