Invention Grant
- Patent Title: Memory cells including resistance variable material patterns of different compositions
- Patent Title (中): 记忆单元包括不同组成的电阻变化材料图案
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Application No.: US12853329Application Date: 2010-08-10
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Publication No.: US08625325B2Publication Date: 2014-01-07
- Inventor: Hyeong-Geun An , Ik-Soo Kim , Hee-Ju Shin , Dong-Hyun Im , Sung-Lae Cho , Eun-Hee Cho
- Applicant: Hyeong-Geun An , Ik-Soo Kim , Hee-Ju Shin , Dong-Hyun Im , Sung-Lae Cho , Eun-Hee Cho
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Volentine & Whitt, PLLC
- Priority: KR10-2009-0073390 20090810
- Main IPC: G11C11/56
- IPC: G11C11/56

Abstract:
A non-volatile memory device includes a plurality of word lines, a plurality of bit lines, and an array of variable resistance memory cells each electrically connected between a respective word line and a respective bit line. Each of the memory cells includes first and second resistance variable patterns electrically connected in series between first and second electrodes. A material composition of the first resistance variable pattern is different than a material composition of the second resistance variable pattern. Multi-bit data states of each memory cell are defined by a contiguous increase in size of a programmable high-resistance volume within the first and second resistance variable patterns.
Public/Granted literature
- US20110032753A1 MEMORY CELLS INCLUDING RESISTANCE VARIABLE MATERIAL PATTERNS OF DIFFERENT COMPOSITIONS Public/Granted day:2011-02-10
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