Invention Grant
US08625340B1 Magnetic sidewalls for write lines in field-induced MRAM and methods of manufacturing them 有权
场诱导MRAM中写入线的磁性侧壁及其制造方法

  • Patent Title: Magnetic sidewalls for write lines in field-induced MRAM and methods of manufacturing them
  • Patent Title (中): 场诱导MRAM中写入线的磁性侧壁及其制造方法
  • Application No.: US13340452
    Application Date: 2011-12-29
  • Publication No.: US08625340B1
    Publication Date: 2014-01-07
  • Inventor: Krishnakumar Mani
  • Applicant: Krishnakumar Mani
  • Applicant Address: US CA Santa Clara
  • Assignee: Magsil Corporation
  • Current Assignee: Magsil Corporation
  • Current Assignee Address: US CA Santa Clara
  • Agency: Hahn & Moodley LLP
  • Agent Vani Moodley, Esq.
  • Main IPC: G11C11/14
  • IPC: G11C11/14
Magnetic sidewalls for write lines in field-induced MRAM and methods of manufacturing them
Abstract:
In one embodiment, there is provided a non-volatile magnetic memory cell. The non-volatile magnetic memory cell comprises a switchable magnetic element; and a word line and a bit line to energize the switchable magnetic element; wherein at least one of the word line and the bit line comprises a magnetic sidewall that is discontinuous.
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