Invention Grant
- Patent Title: Nonvolatile memory devices and methods forming the same
- Patent Title (中): 非易失性存储器件及其形成方法
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Application No.: US13243968Application Date: 2011-09-23
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Publication No.: US08625348B2Publication Date: 2014-01-07
- Inventor: Changhyun Lee , Byoungkeun Son
- Applicant: Changhyun Lee , Byoungkeun Son
- Applicant Address: KR Suwon-Si, Gyeonggi-Do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-Si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2010-0096991 20101005
- Main IPC: G11C16/04
- IPC: G11C16/04

Abstract:
Provided are nonvolatile memory devices and methods of forming the same. The nonvolatile memory device includes a plurality of word lines, a ground select line, string select line, and a dummy word line. Each of distances between the dummy word line and the ground select line and between the dummy word line and the word line is greater than a distance between a pair of the word lines adjacent to each other.
Public/Granted literature
- US20120081958A1 NONVOLATILE MEMORY DEVICES AND METHODS FORMING THE SAME Public/Granted day:2012-04-05
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