Invention Grant
US08627239B2 Mask fabrication supporting method, mask blank providing method, and mask blank dealing system
有权
掩模制造支持方法，掩模空白提供方法和掩模空白处理系统
- Patent Title: Mask fabrication supporting method, mask blank providing method, and mask blank dealing system
- Patent Title (中): 掩模制造支持方法，掩模空白提供方法和掩模空白处理系统
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Application No.: US13464147Application Date: 2012-05-04
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Publication No.: US08627239B2Publication Date: 2014-01-07
- Inventor: Hiroyuki Ishida , Tamiya Aiyama , Koichi Maruyama
- Applicant: Hiroyuki Ishida , Tamiya Aiyama , Koichi Maruyama
- Applicant Address: JP Tokyo
- Assignee: Hoya Corporation
- Current Assignee: Hoya Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F1/00 ; G06K9/00
Abstract:
A mask blank is provided by forming a plurality of films, including at least a thin film to be a transfer pattern, on a board. At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained for each of a plurality of the films.
Public/Granted literature
- US20120260222A1 MASK FABRICATION SUPPORTING METHOD, MASK BLANK PROVIDING METHOD, AND MASK BLANK DEALING SYSTEM Public/Granted day:2012-10-11
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