Invention Grant
- Patent Title: Vapor deposition apparatus and vapor deposition method
- Patent Title (中): 蒸镀装置及气相沉积法
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Application No.: US12535568Application Date: 2009-08-04
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Publication No.: US08632635B2Publication Date: 2014-01-21
- Inventor: Joo-Hyeon Lee , Jin-Koo Chung , Sung-Soo Lee
- Applicant: Joo-Hyeon Lee , Jin-Koo Chung , Sung-Soo Lee
- Applicant Address: KR
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR
- Agency: Innovation Counsel LLP
- Priority: KR10-2008-0124033 20081208
- Main IPC: C23C16/00
- IPC: C23C16/00
Abstract:
A vapor deposition apparatus includes a linear head including a plurality of nozzles, and an angle controller controlling an inclined angle of the linear head. The angle of inclination of the linear head can be varied so as to position different portions of the linear head at different distances from the surface of a substrate.
Public/Granted literature
- US20100143587A1 VAPOR DEPOSITION APPARATUS AND VAPOR DEPOSITION METHOD Public/Granted day:2010-06-10
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