Invention Grant
- Patent Title: System and method for electromagnetic interference shielding for critical dimension-scanning electron microscope
- Patent Title (中): 用于临界尺寸扫描电子显微镜的电磁干扰屏蔽系统和方法
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Application No.: US13175384Application Date: 2011-07-01
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Publication No.: US08633439B2Publication Date: 2014-01-21
- Inventor: Chia-Chi Tsao , Syun-Jie Jhan , Yi-Cheng Shih , Chwen Yu
- Applicant: Chia-Chi Tsao , Syun-Jie Jhan , Yi-Cheng Shih , Chwen Yu
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G01N23/00
- IPC: G01N23/00 ; G21K7/00

Abstract:
System and method for EMI shielding for a CD-SEM are described. One embodiment is a scanning electron microscope (“SEM”) comprising an electron gun for producing an electron beam directed toward a sample; a secondary electron (“SE”) detector for detecting secondary electrons reflected from the sample in response to the electron beam; and a dual-layer shield disposed around and enclosing the SE detector. The shield comprises a magnetic shielding lamina layer and a metallic foil layer.
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