Invention Grant
US08633452B2 Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source
有权
在电感耦合等离子体（ICP）离子源中不同工艺气体之间快速切换的方法和结构
- Patent Title: Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source
- Patent Title (中): 在电感耦合等离子体（ICP）离子源中不同工艺气体之间快速切换的方法和结构
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Application No.: US13182187Application Date: 2011-07-13
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Publication No.: US08633452B2Publication Date: 2014-01-21
- Inventor: Anthony Graupera , Sean Kellogg , Mark W. Utlaut , N. William Parker
- Applicant: Anthony Graupera , Sean Kellogg , Mark W. Utlaut , N. William Parker
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Associates, PC
- Agent Michael O. Scheinberg; John B. Kelly
- Main IPC: H01J27/00
- IPC: H01J27/00
Abstract:
An openable gas passage provides for rapid pumpout of process or bake out gases in an inductively coupled plasma source in a charged particle beam system. A valve, typically positioned in the source electrode or part of the gas inlet, increases the gas conductance when opened to pump out the plasma chamber and closes during operation of the plasma source.
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