Invention Grant
- Patent Title: Display device and manufacturing method thereof
- Patent Title (中): 显示装置及其制造方法
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Application No.: US13075436Application Date: 2011-03-30
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Publication No.: US08633485B2Publication Date: 2014-01-21
- Inventor: Satoshi Kobayashi , Yoshiyuki Kurokawa , Shunpei Yamazaki , Daisuke Kawae
- Applicant: Satoshi Kobayashi , Yoshiyuki Kurokawa , Shunpei Yamazaki , Daisuke Kawae
- Applicant Address: JP Atsugi-shi, Kanagawa
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2007-205694 20070807
- Main IPC: H01L31/00
- IPC: H01L31/00 ; H01L29/10 ; H01L29/76 ; H01L31/036 ; H01L31/112 ; H01L21/02

Abstract:
To provide a display device having a thin film transistor with high electric characteristics and excellent reliability and a manufacturing method thereof. A gate electrode, a gate insulating film provided over the gate electrode, a first semiconductor layer provided over the gate insulating film and having a microcrystalline semiconductor, a second semiconductor layer provided over the first semiconductor layer and having an amorphous semiconductor, and a source region and a drain region provided over the second semiconductor layer are provided. The first semiconductor layer has high crystallinity than the second semiconductor layer. The second semiconductor layer includes an impurity region having a conductivity type different from a conductivity type of the source region and the drain region between the source region and the drain region.
Public/Granted literature
- US20110175091A1 DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2011-07-21
Information query
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