Invention Grant
- Patent Title: Actuator system, lithographic apparatus, method of controlling the position of a component and device manufacturing method
- Patent Title (中): 执行器系统,光刻设备,控制部件位置的方法和装置的制造方法
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Application No.: US12627776Application Date: 2009-11-30
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Publication No.: US08634062B2Publication Date: 2014-01-21
- Inventor: Gosse Charles De Vries , Edwin Johan Buis , Uwe Mickan
- Applicant: Gosse Charles De Vries , Edwin Johan Buis , Uwe Mickan
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/54
- IPC: G03B27/54

Abstract:
An actuator system is provided that is configured to move a component relative to a base of the actuator system. The actuator system may include first and second actuating elements, each including two sections of material that are joined to each other and have different coefficients of thermal expansion. The two actuating elements may be configured such that if the temperature of one is increased it applies a force on the component in a direction that is opposite to the force applied by the other actuating element if its temperature is increased. The actuator system may further include at least one power supply configured to provide independently controllable heating to the first and second actuating elements.
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