Invention Grant
US08634236B2 Phase change memory device, storage system having the same and fabricating method thereof
有权
相变存储器件,具有相同的存储系统及其制造方法
- Patent Title: Phase change memory device, storage system having the same and fabricating method thereof
- Patent Title (中): 相变存储器件,具有相同的存储系统及其制造方法
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Application No.: US13234924Application Date: 2011-09-16
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Publication No.: US08634236B2Publication Date: 2014-01-21
- Inventor: Hye-Young Park , Jeong-Hee Park , Hyun-Suk Kwon
- Applicant: Hye-Young Park , Jeong-Hee Park , Hyun-Suk Kwon
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec, PA
- Priority: KR10-2010-0091985 20100917
- Main IPC: G11C11/00
- IPC: G11C11/00 ; G11C5/02 ; H01L29/06 ; H01L21/00 ; H01L21/06

Abstract:
Provided are a phase change memory device and a fabricating method thereof. The phase change memory device includes a substrate, an interlayer dielectric layer formed on the substrate, first and second contact holes formed in the interlayer dielectric layer, and a memory cell formed in the first and second contact holes and including a diode, a first electrode on the diode, a phase change material layer on the first electrode, and a second electrode on the phase change material layer, wherein the first contact hole and the second contact hole are spaced apart from and separated from each other.
Public/Granted literature
- US20120068136A1 Phase Change Memory Device, Storage System Having the Same and Fabricating Method Thereof Public/Granted day:2012-03-22
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