Invention Grant
US08634236B2 Phase change memory device, storage system having the same and fabricating method thereof 有权
相变存储器件,具有相同的存储系统及其制造方法

Phase change memory device, storage system having the same and fabricating method thereof
Abstract:
Provided are a phase change memory device and a fabricating method thereof. The phase change memory device includes a substrate, an interlayer dielectric layer formed on the substrate, first and second contact holes formed in the interlayer dielectric layer, and a memory cell formed in the first and second contact holes and including a diode, a first electrode on the diode, a phase change material layer on the first electrode, and a second electrode on the phase change material layer, wherein the first contact hole and the second contact hole are spaced apart from and separated from each other.
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