Invention Grant
- Patent Title: Hierarchical nanopatterns by nanoimprint lithography
- Patent Title (中): 纳米压印光刻的分层纳米图案
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Application No.: US12083829Application Date: 2005-10-20
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Publication No.: US08636937B2Publication Date: 2014-01-28
- Inventor: Fengxiang Zhang , Hong Yee Low
- Applicant: Fengxiang Zhang , Hong Yee Low
- Applicant Address: SG Centros
- Assignee: Agency for Science, Technology and Research
- Current Assignee: Agency for Science, Technology and Research
- Current Assignee Address: SG Centros
- Agency: Jacobson Holman PLLC
- International Application: PCT/SG2005/000364 WO 20051020
- International Announcement: WO2007/046772 WO 20070426
- Main IPC: B29C59/02
- IPC: B29C59/02

Abstract:
A method for forming hierarchical patterns on an article by nanoimprinting is disclosed. The method includes using a first mold to form a primary pattern on the article at a first temperature and a first pressure, the first temperature and the first pressure being able to reduce the elastic modulus of the article; and using a second mold to form a second pattern on the primary pattern at a second temperature that is below the article's glass transition temperature, the forming of the second pattern being at a second pressure.
Public/Granted literature
- US20090047478A1 Hierarchical Nanopatters by Nanoimprint Lithography Public/Granted day:2009-02-19
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