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US08636937B2 Hierarchical nanopatterns by nanoimprint lithography 有权
纳米压印光刻的分层纳米图案

Hierarchical nanopatterns by nanoimprint lithography
Abstract:
A method for forming hierarchical patterns on an article by nanoimprinting is disclosed. The method includes using a first mold to form a primary pattern on the article at a first temperature and a first pressure, the first temperature and the first pressure being able to reduce the elastic modulus of the article; and using a second mold to form a second pattern on the primary pattern at a second temperature that is below the article's glass transition temperature, the forming of the second pattern being at a second pressure.
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