Invention Grant
- Patent Title: Methods of forming a non-volatile resistive oxide memory array
- Patent Title (中): 形成非易失性电阻氧化物存储器阵列的方法
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Application No.: US13354163Application Date: 2012-01-19
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Publication No.: US08637113B2Publication Date: 2014-01-28
- Inventor: Gurtej Sandhu , John Smythe , Bhaskar Srinivasan
- Applicant: Gurtej Sandhu , John Smythe , Bhaskar Srinivasan
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John, P.S.
- Main IPC: C23C18/00
- IPC: C23C18/00 ; C23C20/00 ; C23C28/00 ; C23C30/00 ; H01C17/06

Abstract:
A method of forming a non-volatile resistive oxide memory array includes forming a plurality of one of conductive word lines or conductive bit lines over a substrate. Metal oxide-comprising material is formed over the plurality of said one of the word lines or bit lines. A series of elongated trenches is provided over the plurality of said one of the word lines or bit lines. A plurality of self-assembled block copolymer lines is formed within individual of the trenches in registered alignment with and between the trench sidewalls. A plurality of the other of conductive word lines or conductive bit lines is provided from said plurality of self-assembled block copolymer lines to form individually programmable junctions comprising said metal oxide-comprising material where the word lines and bit lines cross one another.
Public/Granted literature
- US20120122292A1 Methods of Forming a Non-Volatile Resistive Oxide Memory Array Public/Granted day:2012-05-17
Information query
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