Invention Grant
US08637156B2 Methods for producing coated phosphors and host material particles using atomic layer deposition methods
有权
使用原子层沉积方法制备涂覆的磷光体和主体材料颗粒的方法
- Patent Title: Methods for producing coated phosphors and host material particles using atomic layer deposition methods
- Patent Title (中): 使用原子层沉积方法制备涂覆的磷光体和主体材料颗粒的方法
-
Application No.: US13453157Application Date: 2012-04-23
-
Publication No.: US08637156B2Publication Date: 2014-01-28
- Inventor: Alan W. Weimer , Steven M. George , Karen J. Buochler , Joseph A. Spencer, II , Jarod McCormick
- Applicant: Alan W. Weimer , Steven M. George , Karen J. Buochler , Joseph A. Spencer, II , Jarod McCormick
- Agency: Gary C Cohn PLLC
- Main IPC: B32B5/16
- IPC: B32B5/16
Abstract:
Layers of a passivating material and/or containing luminescent centers are deposited on phosphor particles or particles that contain a host material that is capable of capturing an excitation energy and transferring it to a luminescent center or layer. The layers are formed in an ALD process. The ALD process permits the formation of very thin layers. Coated phosphors have good resistance to ambient moisture and oxygen, and/or can be designed to emit a distribution of desired light wavelengths.
Public/Granted literature
- US20120199793A1 Methods for producing coated phosphors and host material particles using atomic layer deposition methods Public/Granted day:2012-08-09
Information query
