Invention Grant
US08637220B2 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition
有权
光敏感或辐射敏感性树脂组合物，以及使用该组合物的抗蚀剂膜和图案形成方法
- Patent Title: Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition
- Patent Title (中): 光敏感或辐射敏感性树脂组合物，以及使用该组合物的抗蚀剂膜和图案形成方法
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Application No.: US13172025Application Date: 2011-06-29
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Publication No.: US08637220B2Publication Date: 2014-01-28
- Inventor: Tomotaka Tsuchimura , Hideaki Tsubaki , Toshiya Takahashi
- Applicant: Tomotaka Tsuchimura , Hideaki Tsubaki , Toshiya Takahashi
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2010-148386 20100629
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039
Abstract:
An actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a guanidine compound having a logP value of 1.2 or more, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.
Public/Granted literature
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