Invention Grant
US08637369B2 Method for manufacturing an integrated power device having gate structures within trenches
有权
用于制造在沟槽内具有栅极结构的集成功率器件的方法
- Patent Title: Method for manufacturing an integrated power device having gate structures within trenches
- Patent Title (中): 用于制造在沟槽内具有栅极结构的集成功率器件的方法
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Application No.: US13409411Application Date: 2012-03-01
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Publication No.: US08637369B2Publication Date: 2014-01-28
- Inventor: Angelo Magri , Antonino Sebastiano Alessandria , Stefania Fortuna , Leonardo Fragapane
- Applicant: Angelo Magri , Antonino Sebastiano Alessandria , Stefania Fortuna , Leonardo Fragapane
- Applicant Address: IT Agrate Brianza
- Assignee: STMicroelectronics S.R.L.
- Current Assignee: STMicroelectronics S.R.L.
- Current Assignee Address: IT Agrate Brianza
- Agency: Graybeal Jackson LLP
- Priority: ITMI2008A2361 20081231
- Main IPC: H01L21/336
- IPC: H01L21/336

Abstract:
An embodiment of a method for manufacturing a power device with conductive gate structures inside etched trenches. Such trenches include sidewalls and a bottom, wherein covering the sidewalls and the bottom of the trench is a first insulating coating layer. In the formation of the conductive gate structure, openings within the first material in the trench are made such that a conductive central region of a second conductive material having a different resistivity than the first conductive material are able to be electrically coupled together through a plurality of conductive bridges between said second conductive coating layer and said conductive central region.
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