- Patent Title: Silicon surface texturing method for reducing surface reflectance
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Application No.: US13165339Application Date: 2011-06-21
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Publication No.: US08637405B2Publication Date: 2014-01-28
- Inventor: Mahadevaiyer Krishnan , Jun Liu , Satyavolu S. Papa Rao , George G. Totir
- Applicant: Mahadevaiyer Krishnan , Jun Liu , Satyavolu S. Papa Rao , George G. Totir
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Louis J. Percello, Esq.
- Main IPC: H01L31/18
- IPC: H01L31/18 ; C09K13/02

Abstract:
A method of texturing a surface of a crystalline silicon substrate is provided. The method includes immersing a crystalline silicon substrate into an aqueous alkaline etchant solution to form a pyramid shaped textured surface, with (111) faces exposed, on the crystalline silicon substrate. The aqueous alkaline etchant solution employed in the method of the present disclosure includes an alkaline component and a nanoparticle slurry component. Specifically, the aqueous alkaline etchant solution of the present disclosure includes 0.5 weight percent to 5 weight percent of an alkaline component and from 0.1 weight percent to 5 weight percent of a nanoparticle slurry on a dry basis.
Public/Granted literature
- US20120329200A1 SILICON SURFACE TEXTURING METHOD FOR REDUCING SURFACE REFLECTANCE Public/Granted day:2012-12-27
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