Invention Grant
- Patent Title: Fluid handling structure, lithographic apparatus and a device manufacturing method
- Patent Title (中): 流体处理结构，光刻设备和器件制造方法
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Application No.: US13085069Application Date: 2011-04-12
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Publication No.: US08638417B2Publication Date: 2014-01-28
- Inventor: Danny Maria Hubertus Philips , Daniel Jozef Maria Direcks , Clemens Johannes Gerardus Van Den Dungen , Maikel Adrianus Cornelis Schepers , Paul Petrus Joannes Berkvens , Marcus Johannes Van Der Zanden , Pieter Mulder
- Applicant: Danny Maria Hubertus Philips , Daniel Jozef Maria Direcks , Clemens Johannes Gerardus Van Den Dungen , Maikel Adrianus Cornelis Schepers , Paul Petrus Joannes Berkvens , Marcus Johannes Van Der Zanden , Pieter Mulder
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42
Abstract:
A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.
Public/Granted literature
- US20110255062A1 FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD Public/Granted day:2011-10-20
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