Invention Grant
- Patent Title: Flow rate control device
- Patent Title (中): 流量控制装置
-
Application No.: US12810362Application Date: 2009-01-07
-
Publication No.: US08640731B2Publication Date: 2014-02-04
- Inventor: Junichi Isetani
- Applicant: Junichi Isetani
- Applicant Address: JP Tokyo
- Assignee: Azbil Corporation
- Current Assignee: Azbil Corporation
- Current Assignee Address: JP Tokyo
- Agency: Troutman Sanders LLP
- Priority: JP2008-001166 20080108
- International Application: PCT/JP2009/050080 WO 20090107
- International Announcement: WO2009/088017 WO 20090716
- Main IPC: F16K31/12
- IPC: F16K31/12

Abstract:
A flow rate control device includes: a fuel gas supply channel having a flow rate adjusting valve; a thermal type mass flow rate sensor arranged in the supply channel; a calculation unit which calculates a thermal quantity flow rate of the fuel gas defined by a product of a volume flow rate of the fuel gas and a heat generation quantity per unit volume of the fuel gas according to an output from the thermal type sensor; and a flow rate control unit which controls the open degree of the flow rate adjusting valve according to a difference between a control target value for controlling the thermal quantity flow rate and the thermal quantity flow rate calculated by the calculation unit.
Public/Granted literature
- US20100269922A1 FLOW RATE CONTROL DEVICE Public/Granted day:2010-10-28
Information query