Invention Grant
- Patent Title: Extrusion reduction in imprint lithography
- Patent Title (中): 压印光刻中的挤出减少
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Application No.: US13743772Application Date: 2013-01-17
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Publication No.: US08641958B2Publication Date: 2014-02-04
- Inventor: Niyaz Khusnatdinov , Christopher Ellis Jones , Joseph G. Perez , Dwayne L. LaBrake , Ian Matthew McMackin
- Applicant: Niyaz Khusnatdinov , Christopher Ellis Jones , Joseph G. Perez , Dwayne L. LaBrake , Ian Matthew McMackin
- Applicant Address: US TX Austin
- Assignee: Molecular Imprints, Inc.
- Current Assignee: Molecular Imprints, Inc.
- Current Assignee Address: US TX Austin
- Agent Cameron A. King
- Main IPC: B28B1/14
- IPC: B28B1/14 ; B27N3/18 ; B29C35/08 ; A01J21/00
Abstract:
Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified.
Public/Granted literature
- US20130241109A1 EXTRUSION REDUCTION IN IMPRINT LITHOGRAPHY Public/Granted day:2013-09-19
Information query
