Invention Grant
- Patent Title: Hydrogen gas production system utilizing silicon wastewater and method for production of hydrogen energy using the same
- Patent Title (中): 利用硅废水的氢气生产系统及其生产氢能的方法
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Application No.: US13012297Application Date: 2011-01-24
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Publication No.: US08642002B2Publication Date: 2014-02-04
- Inventor: Chae-Seok Choi , Ji-Hyeon Hwang , Youn-Kook Kim
- Applicant: Chae-Seok Choi , Ji-Hyeon Hwang , Youn-Kook Kim
- Applicant Address: KR
- Assignee: Woongjin Coway Co., Ltd.
- Current Assignee: Woongjin Coway Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2010-0014324 20100217
- Main IPC: C01B3/00
- IPC: C01B3/00 ; C01B3/02

Abstract:
Disclosed are a hydrogen energy production system utilizing silicon wastewater and a method for production of hydrogen energy using the same. More particularly, the disclosed system includes: a UF treatment bath wherein the silicon wastewater is treated through UF film filtration to separate UF treated water and a concentrated silicon waste solution therefrom; a line mixer connected to the UF treatment bath in order to admix the separated silicon waste solution with an alkaline material fed from the outside; and a hydrogen production bath connected to the line mixer, wherein the concentrated silicon waste solution in the mixture reacts with the alkaline material, in order to produce hydrogen gas. Additionally, a hydrogen energy production method using the foregoing system is also disclosed.
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