Invention Grant
- Patent Title: Pattern electrode manufacturing method and pattern electrode
- Patent Title (中): 图案电极的制造方法和图案电极
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Application No.: US13144412Application Date: 2009-12-18
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Publication No.: US08642118B2Publication Date: 2014-02-04
- Inventor: Masaki Goto , Akihiko Takeda , Kazuaki Nakamura
- Applicant: Masaki Goto , Akihiko Takeda , Kazuaki Nakamura
- Applicant Address: JP
- Assignee: Konica Minolta Holdings, Inc.
- Current Assignee: Konica Minolta Holdings, Inc.
- Current Assignee Address: JP
- Agency: Cantor Colburn LLP
- Priority: JP2009-007392 20090116
- International Application: PCT/JP2009/071122 WO 20091218
- International Announcement: WO2010/082429 WO 20100722
- Main IPC: B05D5/12
- IPC: B05D5/12 ; B05D3/00
Abstract:
The present invention can easily provide a method of manufacturing a pattern electrode with excellent electroconductivity and excellent transparency and a pattern electrode manufactured according to the method. The method of manufacturing a pattern electrode is characterized in that it comprises the steps of forming on a substrate an electroconductive layer containing metal nanowires, and carrying out pattern printing on the electroconductive layer employing a metal nanowire removing solution, followed by washing with water.
Public/Granted literature
- US20110272176A1 PATTERN ELECTRODE MANUFACTURING METHOD AND PATTERN ELECTRODE Public/Granted day:2011-11-10
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