Invention Grant
- Patent Title: Structural member to be used in apparatus for manufacturing semiconductor or flat display, and method for producing the same
- Patent Title (中): 用于制造半导体或平板显示器的装置中的结构件及其制造方法
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Application No.: US12521387Application Date: 2007-12-21
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Publication No.: US08642187B2Publication Date: 2014-02-04
- Inventor: Tadahiro Ohmi , Minoru Tahara , Yasuhiro Kawase
- Applicant: Tadahiro Ohmi , Minoru Tahara , Yasuhiro Kawase
- Applicant Address: JP Sendai-shi JP Tokyo
- Assignee: National University Corporation Tohoku University,Mitsubishi Chemical Corporation
- Current Assignee: National University Corporation Tohoku University,Mitsubishi Chemical Corporation
- Current Assignee Address: JP Sendai-shi JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-355642 20061228
- International Application: PCT/JP2007/074636 WO 20071221
- International Announcement: WO2008/081748 WO 20080710
- Main IPC: B32B15/00
- IPC: B32B15/00 ; B32B15/01 ; B32B15/04 ; B32B15/10 ; B32B9/00 ; B32B19/00
Abstract:
A structural member for a manufacturing apparatus has a metal base member mainly composed of aluminum, a high-purity aluminum film formed on the surface of the metal base member, and a nonporous amorphous aluminum oxide passivation film which is formed by anodizing the high-purity aluminum film. A method for producing a structural member for a manufacturing apparatus, includes forming a high-purity aluminum film on the surface of a metal base member mainly composed of aluminum, and anodizing the high-purity aluminum film in a chemical conversion liquid having a pH of 4-10 and containing a nonaqueous solvent, which has a dielectric constant lower than that of water and dissolves water, thereby converting at least a surface portion of the high-purity aluminum film into a nonporous amorphous aluminum oxide passivation film.
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