Invention Grant
- Patent Title: Method of direct writing with photons beyond the diffraction limit
- Patent Title (中): 用光子直接写入超过衍射极限的方法
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Application No.: US13678692Application Date: 2012-11-16
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Publication No.: US08642232B2Publication Date: 2014-02-04
- Inventor: David A. Markle , Rudolf H. Hendel , John S. Petersen , Hwan J. Jeong
- Applicant: David A. Markle , Rudolf H. Hendel , John S. Petersen , Hwan J. Jeong
- Applicant Address: US CA Los Gatos
- Assignee: Periodic Structures, Inc.
- Current Assignee: Periodic Structures, Inc.
- Current Assignee Address: US CA Los Gatos
- Agency: Opticus IP Law PLLC
- Main IPC: G03F7/213
- IPC: G03F7/213 ; G03B27/53

Abstract:
Direct-write lithography apparatus and methods are disclosed in which a transducer image and an image of crossed interference fringe patterns are superimposed on a photoresist layer supported by a substrate. The transducer image has an exposure wavelength and contains bright spots, each corresponding to an activated pixel. The interference image has an inhibition wavelength and contains dark spots where the null points in the crossed interference fringes coincide. The dark spots are aligned with and trim the peripheries of the corresponding bright spot to form sub-resolution photoresist pixels having a size smaller than would be formed in the absence of the dark spots.
Public/Granted literature
- US20130130182A1 Apparatus and method of direct writing with photons beyond the diffraction limit Public/Granted day:2013-05-23
Information query
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