Invention Grant
- Patent Title: Method of manufacturing color filter substrate for semitransmissive type liquid crystal display device
- Patent Title (中): 制造半透射型液晶显示装置用滤色器基板的方法
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Application No.: US13337973Application Date: 2011-12-27
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Publication No.: US08642233B2Publication Date: 2014-02-04
- Inventor: Mie Shimizu , Koichi Minato , Takeshi Itoi
- Applicant: Mie Shimizu , Koichi Minato , Takeshi Itoi
- Applicant Address: JP Tokyo
- Assignee: Toppan Printing Co., Ltd.
- Current Assignee: Toppan Printing Co., Ltd.
- Current Assignee Address: JP Tokyo
- Priority: JP2005-247349 20050829
- Main IPC: G02F1/335
- IPC: G02F1/335 ; G02B5/20

Abstract:
A method of a color filter substrate for a semitransmissive type liquid crystal display device, including: forming a photosensitive coloring composition layer containing a photo-polymerizable monomer, a resinous binder, a polymerization initiator, a coloring agent and a solvent on a surface of a transparent substrate, the surface being partitioned into a large number of pixel regions; exposing the photosensitive coloring composition layer to light; and developing the photosensitive coloring composition layer to form a transmissive portion and a reflective portion, the transmissive portion being assigned to colorize a transmitted light from a light source arranged on a rear surface side of a liquid crystal display device, the reflective portion being assigned to colorize a reflected light to be derived from reflection of an external light entering from the observer's side and having a through-hole with a diameter of 10 μm or less.
Public/Granted literature
- US20120094221A1 METHOD OF MANUFACTURING COLOR FILTER SUBSTRATE FOR SEMITRANSMISSIVE TYPE LIQUID CRYSTAL DISPLAY DEVICE Public/Granted day:2012-04-19
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