Invention Grant
- Patent Title: Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same
- Patent Title (中): 光化学射线或辐射敏感性树脂组合物及其形成方法
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Application No.: US13421684Application Date: 2012-03-15
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Publication No.: US08642245B2Publication Date: 2014-02-04
- Inventor: Kana Fujii , Tomotaka Tsuchimura , Toru Fujimori , Hidenori Takahashi , Takayuki Ito
- Applicant: Kana Fujii , Tomotaka Tsuchimura , Toru Fujimori , Hidenori Takahashi , Takayuki Ito
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2009-214948 20090916
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/30 ; G03F7/039
Abstract:
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin that is decomposed when acted on by an acid to thereby increase its solubility in an alkali developer, a compound that generates an acid when exposed to actinic rays or radiation, and any of basic compounds of general formula (1) below.
Public/Granted literature
- US20120231393A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING A PATTERN USING THE SAME Public/Granted day:2012-09-13
Information query
IPC分类:
