Invention Grant
- Patent Title: Photoresponsive nucleic acid manufacturing method
- Patent Title (中): 光响应核酸制造方法
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Application No.: US12867694Application Date: 2009-02-13
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Publication No.: US08642754B2Publication Date: 2014-02-04
- Inventor: Kenzo Fujimoto , Masayuki Ogino , Yoshinaga Yoshimura
- Applicant: Kenzo Fujimoto , Masayuki Ogino , Yoshinaga Yoshimura
- Applicant Address: JP Kawaguchi-shi, Saitama
- Assignee: Japan Science and Technology Agency
- Current Assignee: Japan Science and Technology Agency
- Current Assignee Address: JP Kawaguchi-shi, Saitama
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2008-033713 20080214
- International Application: PCT/JP2009/000562 WO 20090213
- International Announcement: WO2009/101810 WO 20090820
- Main IPC: C07H21/00
- IPC: C07H21/00 ; C07H21/02 ; C07H21/04
Abstract:
The present invention provides a manufacturing method that can easily manufacture a compound known as photoresponsive (photocoupling) nucleic acids at high yield in a shorter period of time than that of the conventional technology. The present invention relates to a method of manufacturing a photoresponsive nucleic acid which includes a step of reacting a nucleic acid having groups represented by the Formula I, the Formula III, the Formula IV, or the Formula V and a compound represented by the Formula II, or reacting a nucleic acid having groups represented by the Formula VI, the Formula VIII, the Formula IX, or the Formula X and a compound represented by the Formula VII by heating them by microwaves in the presence of a metal catalyst, a basic substance, and a solvent.
Public/Granted literature
- US20110040083A1 PHOTORESPONSIVE NUCLEIC ACID MANUFACTURING METHOD Public/Granted day:2011-02-17
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