Invention Grant
- Patent Title: Semiconductor component with high breakthrough tension and low forward resistance
- Patent Title (中): 具有高突破张力和低向前阻力的半导体元件
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Application No.: US13367909Application Date: 2012-02-07
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Publication No.: US08643086B2Publication Date: 2014-02-04
- Inventor: Frank Dieter Pfirsch , Armin Willmeroth , Anton Mauder , Stefan Sedlmaier
- Applicant: Frank Dieter Pfirsch , Armin Willmeroth , Anton Mauder , Stefan Sedlmaier
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Dicke, Billig & Czaja, PLLC
- Priority: DE102005035153 20050727; DE102005039331 20050819
- Main IPC: H01L29/78
- IPC: H01L29/78

Abstract:
A semiconductor component having a semiconductor body is disclosed. In one embodiment, the semiconductor component includes a drift zone of a first conductivity type, a drift control zone composed of a semiconductor material which is arranged adjacent to the drift zone at least in places, a dielectric which is arranged between the drift zone and the drift control zone at least in places. A quotient of the net dopant charge of the drift control zone, in an area adjacent to the accumulation dielectric and the drift zone, divided by the area of the dielectric arranged between the drift control zone and the drift zone is less than the breakdown charge of the semiconductor material in the drift control zone.
Public/Granted literature
- US20120132956A1 SEMICONDUCTOR COMPONENT WITH HIGH BREAKTHROUGH TENSION AND LOW FORWARD RESISTANCE Public/Granted day:2012-05-31
Information query
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