Invention Grant
- Patent Title: Power semiconductor chip having two metal layers on one face
- Patent Title (中): 功率半导体芯片在一个面上具有两个金属层
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Application No.: US13191891Application Date: 2011-07-27
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Publication No.: US08643176B2Publication Date: 2014-02-04
- Inventor: Ralf Otremba , Josef Hoeglauer , Juergen Schredl , Xaver Schloegel
- Applicant: Ralf Otremba , Josef Hoeglauer , Juergen Schredl , Xaver Schloegel
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L23/66
- IPC: H01L23/66

Abstract:
A semiconductor chip includes a power transistor circuit with a plurality of active transistor cells. A first load electrode and a control electrode are arranged on a first face of the semiconductor chip, wherein the first load electrode includes a first metal layer. A second load electrode is arranged on a second face of the semiconductor chip. A second metal layer is arranged over the first metal layer, wherein the second metal layer is electrically insulated from the power transistor circuit and the second metal layer is arranged over an area of the power transistor circuit that comprises at least one of the plurality of active transistor cells.
Public/Granted literature
- US20130027113A1 Power Semiconductor Chip Having Two Metal Layers on One Face Public/Granted day:2013-01-31
Information query
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