Invention Grant
- Patent Title: Thermoset polyimides for microelectronic applications
- Patent Title (中): 用于微电子应用的热固性聚酰亚胺
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Application No.: US12361485Application Date: 2009-01-28
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Publication No.: US08643199B2Publication Date: 2014-02-04
- Inventor: Stephen E. Lehman, Jr. , James C. Matayabas, Jr. , Saikumar Jayaraman
- Applicant: Stephen E. Lehman, Jr. , James C. Matayabas, Jr. , Saikumar Jayaraman
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Main IPC: H01L23/29
- IPC: H01L23/29

Abstract:
Dendrimer/hyperbranched materials are combined with polyimide to form a low CTE material for use as a dielectric substrate layer or an underfill. In the alternative, ruthenium carbene complexes are used to catalyze ROMP cross-linking reactions in polyimides to produce a class of cross-linkable, thermal and mechanical stable material for use as a dielectric substrate or underfill. In another alternative, dendrimers/hyperbranched materials are synthesized by different methods to produce low viscosity, high Tg, fast curing, mechanically and chemically stable materials for imprinting applications.
Public/Granted literature
- US20090146289A1 THERMOSET POLYIMIDES FOR MICROELECTRONIC APPLICATIONS Public/Granted day:2009-06-11
Information query
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