Invention Grant
- Patent Title: Projection optics for microlithography
- Patent Title (中): 微光刻投影光学
-
Application No.: US13045723Application Date: 2011-03-11
-
Publication No.: US08643824B2Publication Date: 2014-02-04
- Inventor: Hans-Juergen Mann
- Applicant: Hans-Juergen Mann
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102007003307 20070117
- Main IPC: G02B17/00
- IPC: G02B17/00 ; G03B27/32 ; G03B27/42 ; G03B27/54
Abstract:
A projection optics for microlithography, which images an object field in an object plane into an image field in an image plane, where the projection optics include at least one curved mirror and including at least one refractive subunit, as well as related systems, components, methods and products prepared by such methods, are disclosed.
Public/Granted literature
- US20110157572A1 PROJECTION OPTICS FOR MICROLITHOGRAPHY Public/Granted day:2011-06-30
Information query
IPC分类:
| G | 物理 |
| G02 | 光学 |
| G02B | 光学元件、系统或仪器 |
| G02B17/00 | 有或无折射元件的具有反射面的系统 |
