Invention Grant
- Patent Title: Interferometric surface inspection using a slit-shaped reference beam from inspection surface
- Patent Title (中): 使用来自检查表面的狭缝状参考光束进行干涉测试
-
Application No.: US12926622Application Date: 2010-11-30
-
Publication No.: US08643845B2Publication Date: 2014-02-04
- Inventor: Eui-Shin Shin , Myeng Woo Nam , Jin-Han Park , Jae-Seok Park
- Applicant: Eui-Shin Shin , Myeng Woo Nam , Jin-Han Park , Jae-Seok Park
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2009-0117891 20091201
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01B11/02

Abstract:
Provided are a surface inspection apparatus and method capable of detecting foreign materials on the surface of a substrate, and a slit coater having the surface inspection apparatus. In the surface inspection apparatus, a slit lighting unit irradiates slit-shaped light. An optical system splits the slit-shaped light into two beams traveling along two different paths, is incident upon a subject, and extracts an interference image caused by combination of the two beams reflected from the subject. An imaging device captures the interference image to output an image signal. An analysis unit acquires a luminance value of the image signal, analyzes the luminance value in real time, and determines whether or not foreign materials are present.
Public/Granted literature
- US20110128550A1 Surface inspection apparatus and method, and slit coater using the same Public/Granted day:2011-06-02
Information query