Invention Grant
US08647433B2 Germanium ingots/wafers having low micro-pit density (MPD) as well as systems and methods for manufacturing same 有权
具有低微坑密度(MPD)的锗锭/晶片以及其制造方法

  • Patent Title: Germanium ingots/wafers having low micro-pit density (MPD) as well as systems and methods for manufacturing same
  • Patent Title (中): 具有低微坑密度(MPD)的锗锭/晶片以及其制造方法
  • Application No.: US12636778
    Application Date: 2009-12-13
  • Publication No.: US08647433B2
    Publication Date: 2014-02-11
  • Inventor: Weiguo LiuXiao Li
  • Applicant: Weiguo LiuXiao Li
  • Applicant Address: US CA Fremont
  • Assignee: AXT, Inc.
  • Current Assignee: AXT, Inc.
  • Current Assignee Address: US CA Fremont
  • Agency: Alston & Bird LLP
  • Main IPC: C30B21/02
  • IPC: C30B21/02
Germanium ingots/wafers having low micro-pit density (MPD) as well as systems and methods for manufacturing same
Abstract:
Systems and methods are disclosed for crystal growth including features of reducing micropit cavity density in grown germanium crystals. In one exemplary implementation, there is provided a method of inserting an ampoule with raw material into a furnace having a heating source, growing a crystal using a vertical growth process wherein movement of a crystallizing temperature gradient relative to the raw material/crucible is achieved to melt the raw material, and growing, at a predetermined crystal growth length, the material to achieve a monocrystalline crystal, wherein monocrystalline ingots having reduced micro-pit densities are reproducibly provided.
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