Invention Grant
- Patent Title: Germanium ingots/wafers having low micro-pit density (MPD) as well as systems and methods for manufacturing same
- Patent Title (中): 具有低微坑密度(MPD)的锗锭/晶片以及其制造方法
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Application No.: US12636778Application Date: 2009-12-13
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Publication No.: US08647433B2Publication Date: 2014-02-11
- Inventor: Weiguo Liu , Xiao Li
- Applicant: Weiguo Liu , Xiao Li
- Applicant Address: US CA Fremont
- Assignee: AXT, Inc.
- Current Assignee: AXT, Inc.
- Current Assignee Address: US CA Fremont
- Agency: Alston & Bird LLP
- Main IPC: C30B21/02
- IPC: C30B21/02

Abstract:
Systems and methods are disclosed for crystal growth including features of reducing micropit cavity density in grown germanium crystals. In one exemplary implementation, there is provided a method of inserting an ampoule with raw material into a furnace having a heating source, growing a crystal using a vertical growth process wherein movement of a crystallizing temperature gradient relative to the raw material/crucible is achieved to melt the raw material, and growing, at a predetermined crystal growth length, the material to achieve a monocrystalline crystal, wherein monocrystalline ingots having reduced micro-pit densities are reproducibly provided.
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