Invention Grant
- Patent Title: Method for manufacturing structure
- Patent Title (中): 制造结构的方法
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Application No.: US12778688Application Date: 2010-05-12
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Publication No.: US08647558B2Publication Date: 2014-02-11
- Inventor: Tamaki Sato
- Applicant: Tamaki Sato
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2009-134075 20090603
- Main IPC: B29C35/08
- IPC: B29C35/08

Abstract:
A method for manufacturing a structure includes, in the following order, preparing a substrate having a positive-type photosensitive resin layer and an absorption layer stacked thereon in this order, the absorption layer being capable of absorbing a light having a photosensitive wavelength which the positive-type photosensitive resin senses; pressing a projecting portion of a mold into both the positive-type photosensitive resin layer and the absorption layer; separating the mold from both layers; irradiating the two layers with the light from an upper face side of both layers; removing the absorption layer; and developing the positive-type photosensitive resin layer.
Public/Granted literature
- US20100310990A1 METHOD FOR MANUFACTURING STRUCTURE Public/Granted day:2010-12-09
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