Invention Grant
- Patent Title: Methos and device for keeping mask dimensions constant
- Patent Title (中): Methos和保持面膜尺寸恒定的装置
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Application No.: US13261175Application Date: 2010-08-06
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Publication No.: US08647797B2Publication Date: 2014-02-11
- Inventor: Takaaki Ishii , Tomas Hülsmann , Tobias Hickmann
- Applicant: Takaaki Ishii , Tomas Hülsmann , Tobias Hickmann
- Applicant Address: DE Garching
- Assignee: Suss Microtec Lithography GmbH
- Current Assignee: Suss Microtec Lithography GmbH
- Current Assignee Address: DE Garching
- Agency: Ohlandt, Greleey, Ruggiero & Perle, L.L.P.
- Priority: DE102009036953 20090811; DE102010020324 20100512
- International Application: PCT/EP2010/061479 WO 20100806
- International Announcement: WO2011/018418 WO 20110217
- Main IPC: G03F9/00
- IPC: G03F9/00
Abstract:
The present application describes a method and a device for keeping the mask dimensions of a mask (6) constant in the mask plane in lithography. The mask (6) is heated due to the exposure during lithography. By means of thermal and/or mechanical methods, the dimensions of the mask (6) are kept constant. It is possible to use additional methods or devices, e.g. an air cooler (17) or an air heater (17), in order to prevent a change in the mask dimensions in the mask plane.
Public/Granted literature
- US20120141928A1 METHOS AND DEVICE FOR KEEPING MASK DIMENSIONS CONSTANT Public/Granted day:2012-06-07
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