Invention Grant
- Patent Title: Photosensitive resin composition, photosensitive dry film and method for forming pattern
- Patent Title (中): 感光树脂组合物,感光干膜和形成图案的方法
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Application No.: US13519495Application Date: 2010-12-27
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Publication No.: US08647807B2Publication Date: 2014-02-11
- Inventor: Akifumi Ueda , Hidetaka Nakagawara , Kazuo Watanabe , Shigeki Watanabe , Wei Jen Lan , Chao Wen Lin
- Applicant: Akifumi Ueda , Hidetaka Nakagawara , Kazuo Watanabe , Shigeki Watanabe , Wei Jen Lan , Chao Wen Lin
- Applicant Address: JP Koshigaya-shi TW Taoyuan Hsien JP Tokyo
- Assignee: Micro Process Inc.,Everlight Chemical Industrial Corporation,Mitsubishi Rayon Co., Ltd.
- Current Assignee: Micro Process Inc.,Everlight Chemical Industrial Corporation,Mitsubishi Rayon Co., Ltd.
- Current Assignee Address: JP Koshigaya-shi TW Taoyuan Hsien JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-297144 20091228
- International Application: PCT/JP2010/073532 WO 20101227
- International Announcement: WO2011/081131 WO 20110707
- Main IPC: G03F7/023
- IPC: G03F7/023 ; G03F7/30

Abstract:
A photosensitive resin composition comprising: a vinyl-based polymer (I) obtained by polymerizing a monomer mixture containing a monomer (a) having a phenolic hydroxyl group; a vinyl-based polymer (II) obtained by polymerizing a monomer mixture containing a carboxyl group-containing vinyl monomer (b), and having a weight average molecular weight of 20,000 to 100,000, provided that the vinyl-based polymer (I) is excluded; a quinonediazide compound (III); and a compound (IV) represented by following formula (5).[In the formula, Y is a hydrocarbon group of 1 to 6 carbon atoms; l and m are each independently an integer of 1 to 3; n is 1 or 2; p and q are each independently 0 or 1.].
Public/Granted literature
- US20130004895A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM AND METHOD FOR FORMING PATTERN Public/Granted day:2013-01-03
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