Invention Grant
US08647808B2 Fluorinated monomer, polymer, resist composition, and patterning process
有权
氟化单体，聚合物，抗蚀剂组合物和图案化工艺
- Patent Title: Fluorinated monomer, polymer, resist composition, and patterning process
- Patent Title (中): 氟化单体，聚合物，抗蚀剂组合物和图案化工艺
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Application No.: US13081182Application Date: 2011-04-06
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Publication No.: US08647808B2Publication Date: 2014-02-11
- Inventor: Masayoshi Sagehashi , Koji Hasegawa , Takeshi Sasami
- Applicant: Masayoshi Sagehashi , Koji Hasegawa , Takeshi Sasami
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2010-088537 20100407
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C08F24/00 ; C08F220/24 ; G03F7/039
Abstract:
A fluorinated monomer has formula (1) wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or a monovalent hydrocarbon group, R4 to R6 each are a monovalent fluorinated hydrocarbon group, A is a divalent hydrocarbon group, and k1 is 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer in formulating a resist composition.
Public/Granted literature
- US20110250539A1 FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS Public/Granted day:2011-10-13
Information query
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