Invention Grant
- Patent Title: Polyfunctional dimethylnaphthalene formaldehyde resin, and process for production thereof
- Patent Title (中): 多官能二甲基萘甲醛树脂及其制造方法
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Application No.: US12743157Application Date: 2008-11-11
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Publication No.: US08648152B2Publication Date: 2014-02-11
- Inventor: Seiji Kita , Masashi Ogiwara
- Applicant: Seiji Kita , Masashi Ogiwara
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-298110 20071116; JP2007-317102 20071207
- International Application: PCT/JP2008/070498 WO 20081111
- International Announcement: WO2009/063860 WO 20090522
- Main IPC: C08F283/00
- IPC: C08F283/00 ; C08G10/02

Abstract:
The present invention provides a polyfunctional dimethylnaphthalene formaldehyde resin which is polyfunctional, rich in reactivity and useful as a variety of raw materials to be modified, specifically a dimethylnaphthalene formaldehyde resin obtained by allowing (1) one kind or two or more kinds of a dimethylnaphthalene having one methyl group on each of two benzene rings in a naphthalene ring thereof and selected from the group consisting of 1,5-dimethylnaphthalene, 1,6-dimethylnaphthalene, 2,6-dimethylnaphthalene, 1,7-dimethylnaphthalene, 1,8-dimethylnaphthalene and 2,7-dimethylnaphthalene; and (2) formaldehyde to react with each other in the presence of water and an acid catalyst, the polyfunctional dimethylnaphthalene formaldehyde resin having a mean value of the number of hydrogen atoms substituted by the reaction among the six hydrogen atoms directly bonded on the naphthalene ring in the dimethylnaphthalene of from 1.8 to 3.5.
Public/Granted literature
- US20100324255A1 POLYFUNCTIONAL DIMETHYLNAPHTHALENE FORMALDEHYDE RESIN, AND PROCESS FOR PRODUCTION THEREOF Public/Granted day:2010-12-23
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