Invention Grant
- Patent Title: Charged particle beam apparatus
- Patent Title (中): 带电粒子束装置
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Application No.: US13939767Application Date: 2013-07-11
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Publication No.: US08648300B2Publication Date: 2014-02-11
- Inventor: Miki Isawa , Minoru Yamazaki , Yuzuru Mizuhara , Hiroshi Makino , Hideyuki Kazumi
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2012/156074 20120712
- Main IPC: G01N23/00
- IPC: G01N23/00 ; G21K7/00

Abstract:
The charged particle beam apparatus having an opening formation member formed with an opening for passage of a charged particle beam emitted from a charged particle source, and either a detector adapted to detect charged particles having passed through the passage opening or a detector adapted to detect charged particles resulting from bombardment on another member of the charged particles having passed through the opening, comprises an aligner for aligning charged particles discharged from the sample and a control unit for controlling the aligner, wherein the control unit controls the aligner to cause it to shift trajectories of the charged particles discharged from the sample so that length measurement may be executed on the basis of detection signals before and after the alignment by the aligner.
Public/Granted literature
- US20140014836A1 CHARGED PARTICLE BEAM APPARATUS Public/Granted day:2014-01-16
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